All Substrates
Substrates

DELO PHOTOBOND 4442

DELO

Required dose

3600

mJ/cm²

Wavelength

320–410

nm

Cure time

s

Tg

°C

Shore hardness

Service temp

°C

Curing & layer

Cure spectrum + sandwich layout
320–410 nm · UV-A200280315400700UV-CUV-BUV-AVisibleBauteil ABauteil B100 µm

UV & Cure

Curing
Ref. layer thickness
100 µm
Layer thickness range
50 – 1000 µm

Mechanical

Request mechanical data from manufacturer

Thermal & Optical

Request thermal and optical data from manufacturer

Resistance

Request resistance data from manufacturer

Compatible substrates

Request substrate compatibility from manufacturer

Compliance & Zertifizierungen

Request certifications from manufacturer

Verarbeitung

Request processing data from manufacturer

Lagerung & Haltbarkeit

Request storage info from manufacturer

Available in 3 apps

2 recommended

Usable (not primary recommendation)

Field reports

Forum · luvex.tech

How does DELO PHOTOBOND 4442 behave in practice? Processing hints, lifetime experience, hands-on cure tips — all in the LUVEX forum under a dedicated topic for this substrate.

Forum topics are created automatically per substrate. Login on luvex.tech via the domain cookie — you stay signed in across simulator and forum.

Datenblatt & Quellen

Versionierte Datenblatt-Anbindung folgt in Sprint L0d-Activation.

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